TY  - RPRT
TI  - Interferometric metrology of photomask blanks: approaches using 633 nm wavelength
AU  - Evans, C J
AU  - Davies, A D
AU  - Parks, R E
AU  - Shao, L-Z
PY  - 2000
PB  - National Institute of Standards and Technology
CY  - Gaithersburg, MD
SN  - NIST IR 6701
DO  - 10.6028/NIST.IR.6701
ER  -