TY  - RPRT
TI  - The effect of the gate oxide thickness on the speed of MOS integrated circuits 
AU  - Kim, J S
PY  - 1987
PB  - National Bureau of Standards
CY  - Gaithersburg, MD
SN  - NBS IR 87-3668
DO  - 10.6028/NBS.IR.87-3668
ER  -